One Show Merit for Groundwork logo

The 2008 One Show Design competition has recognized the Groundwork logo with a Merit Award. One Show Design has become a highly-respected worldwide competition that’s unique in the industry for recognizing excellence in design. This international competition was judged by Marian Bantjes of Quatrifolio | Bowen Island, Brian Collins of Collins | New York, Jenny Ehlers of King James | Cape Town, Keiko Hirano of Communication Design Laboratory | Tokyo, Sarah Moffat of Turner Duckworth | San Francisco, Clement Mok of San Francisco, Emily Oberman of Number 17 | New York, Alvaro Rego of Mumedi | Mexico, and Laurie Rosenwald of New York.